Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment

Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in solventless development step. Conveniently, patterns are formed by two or more interfering laser beams without the need for lithographic mask. The use of nanosecond pulsed light-based interference lithography strengthens pattern resolution through absence vibrational line distortions. Typically, conventional photoembossing protocol consists an exposure step at room temperature that followed thermal high temperature. In this work, we explore possibility perform holographic directly generated using modified compared with those one. Importantly, enhancement height has been observed exposing samples temperature, reaching approximately double heights when obtained protocol. Advantageously, light dose needed reach optimum and amount photoinitiator can be substantially reduced protocol, demonstrating it efficient process generation photopolymers. Kidney epithelial cell alignment studies substrates relief-height optimized described protocols demonstrate improved highlighting relevance reached method. Although well-known enhanced increasing polymeric grating, our work demonstrates nano-second as tool easily gratings tunable topography range interest fundamental studies.